China Rare Metal Material Co., Limited

Jiangxi, China

We Offer Si90Al10wt% sputtering target (silicon aluminum sputtering target) purity 99.9%min produce way: HIP(hot isostatic pressing) max size: 950mm length x280mm width RD 98% we with competitive price and high quality and always welcome your inquires.

• MOQ 1 Kilogram

We are offering hafnium oxide evaporation material(hfo2).

We Offer Zinc Oxide sputtering target, 99.99%min. we with the competitive price and high quality and always welcome your inquires. Sincerely looking forward for your cooperation.

We are offering zirconium yttrium (zry) alloy sputtering target purity --- zr-y 85/15 (at%) 99.9% shape --- discs, plate, step (dia ≤350mm, thickness ≥1mm) rectangle, sheet, step (length ≤600mm, width ≤350mm, thickness ≥1mm) tube( diameter 2mm ) zirconium yttrium (zry) alloy purity --- zr-y 85/15 (at%) 99.5%, 99.9% shape --- lump .

We are offering aluminum oxide evaporation materials. Aluminum oxide evaporation materials purity--- 99%, 99.9%, 99.99% or international standards type shape--- white granules, irregular pieces, cylinder, pellet, taper, custom-made.

We are offering silicon substrate. crystal structure:cubica=5.0430 melting point (℃):1415 density (g/cm3):2.33 conductive type:intrinsic /n/p doped:undoped/p/b.