HHV provides high performance sputtering targets in a wide range of materials, sizes and forms. This includes precious metals and non-precious metals, engineered specialty alloys, ceramics and specialty inorganic thin film PVD chemicals for a variety of target configurations. Forms include standard geometries likeCircular (2”~12”Dia), rectangular, cylindrical type, and rotary as well as custom designs for specialized processes.Target backing plateswith customised sizes and configurations can be provided with wide variety of materials including copper, aluminium, molybdenum and stainless steel.

HHV provides high performance sputtering targets in a wide range of materials, sizes and forms. This includes precious metals and non-precious metals, engineered specialty alloys, ceramics and specialty inorganic thin film PVD chemicals for a variety of target configurations. Forms include standard geometries likeCircular (2”~12”Dia), rectangular, cylindrical type, and rotary as well as custom designs for specialized processes.Target backing plateswith customised sizes and configurations can be provided with wide variety of materials including copper, aluminium, molybdenum and stainless steel.