Chemical vapor deposition (CVD) allows a thin film to be grown on a substrate through molecules and molecular fragments adsorbing and reacting on a surface. This example illustrates the modeling of such a CVD reactor where triethyl-gallium first decomposes, and the reaction produmore...
Valence Process Equipment offers both production and research-sized MOCVD reactor systems for Group III-Nitride and InGaAl-AsP material systems. We can provide a high degree of customization to suit your specific process requirements. Valence Process Equipment patented, 500-semore...
Qrystal TM is a research grade chemical vapour deposition system, with 12 independent temperature zones , each capable of reaching temperatures upto 1150 °C . It has an inbuilt precision mass flow controller allowing controlled injection of upto 4 gases . A back pmore...