ZhongNuo Advanced Material Co., Limited

Beijing, China

Product descriptioniterm namehigh purity copper sputtering target 99.9999% 6n cu targetshapesquareround, according to your request available sizeround: dia 25350mmrectangular: length up to 1500mmcustomization is availablcertificates iso9001:2008, sgs, the third test reporttechnicsvacuum melting, patented thermo-mechanical processapplicationwidely used in coating processing industriesa: architectural glass, car using glass, graphic display field.B:electronic and semiconductor field.C:decoration and mould field. d:advanced packing applicationadvantagesmicrostructure:uniform equiaxed fine grain, consistent microstructure, average grain size

Product descriptionitem name high purity aluminum sputtering target 99.9995% al target 5n5 purity 99.999%, 99.9995% shape squareround, according to your requestavailable size round: dia 25250mmrectangular: length up to 1500mm customization is availablecertificates iso9001:2008, sgs, the third test reporttechnics vacuum meltingapplicationwidely used in coating processing industriesa: architectural glass, car using glass, graphic display field.B:electronic and semiconductor field.C:decoration and mould field. d:advanced packing application.Company informationzhongnuo is a manufacture dealing with high purity metals, good quality and high purity is always our advantage. zhongnuo specilizes in manufacture for all kinds of pure metals, evaporation sources and sputtering targets for use in both thermal and e-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics in a variety of shapes, sizes and purities for r&d applications. In addition, our sputter target bonding and precious metals reclamation services save our customers time and money. Customers can access msds and material certification sheets from us for all materials. We are always ensuring your standards are met by meeting our own quality demands. High purity metal: al, ag, au, bi, co, cr, cu, fe, hf, mg, mn, mo, nb, ni, pb, pd, in, si, sn, ta, ti, zn, zr, w targets and evaporation material. Ceramic targets: nb205, ta205, ito, sno2, zno, al2o3, azo, ges and tio2, ti2o3, ti3o5 precions metal: au, ag, pt, pd, ru, rh and ir alloy targets: ni-cr, ti-al, cr-al, si-al, w-ti, cu-ni, ta-x, mo-nb and co-fe-x