We distribute spin coater in secunderabad, telangana, india. It is used to deposit uniform thin films to flat substrates.usually a small amount of coating material is applied on the center of the substrates. The substrate is then rotated at high speed in order to spread the coating material by centrifugal force until the desired thickness of the film is achieved.Special features:saving and applying speed profileonline display of speed profile on screenhigh accuracy wafer holder rotation speed upto 5000 rpmlow vibration and noise intensity.