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ALUMINUM NITRIDE SPUTTERING TARGETS

Purity 99.5-99.9
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Weight (lbs) 1-2 3-10 11-25 26-100

Specifications Purity99.5-99.9Particle SizeinquireCAS24304-00-5Melting Point2200oC 3992oFDensity3.26 Gcm3CompositionAl - 65.8 , N - 34.2Crystal StructureHexFormSputtering TargetsApplicationsThin Film Deposition Optical CoatingsMohs Hardness @ 20oC09-OctCost Per Pound Weight (lbs)Price1-2inquire3-10inquire11-25inquire26-100inquireCategories: Al, Aluminum Nitride. Tags: High Purity Metals, High Temperature Coatings, Pigments, Colorants & Cosmetics, Vapor Deposition Materials.Description Aluminum Nitride Sputtering Targets

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ALUMINUM OXIDE SPUTTERING TARGETS

Purity 99.99+
Particle Size inquire
Weight (lbs) 1-2 3-10 11-25 26-100

Specifications Purity99.99+Particle SizeinquireCAS1344-28-1Melting Point2072oC 3761.6oFBoiling Point2980oC 5396oFDensity3.965 Gcm3Crystal StructureHexagonalElectric Resistivity1x1022 [cm]FormSputtering TargetsApplicationsThin Film Deposition Optical CoatingsMohs Hardness @ 20oC9Cost Per Pound Weight (lbs)Price1-2inquire3-10inquire11-25inquire26-100inquireCategories: Al, Aluminum Oxide. Tags: High Purity Metals, High Temperature Coatings, Pigments, Colorants & Cosmetics, Vapor Deposition Materials.Description Aluminum Oxide Sputtering Targets

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