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We offer a complete product range of Ultra Pure Silicon Carbide Plates and Sputtering Targets

Ultra Pure Silicon Carbide Plates

  • Thickness 0.5mm – 10mm
  • sizes 450mm x 450mm
Ultra Pure Silicon Carbide Plates Ultra-pure Performance SiC and Low Resistivity Performance SiC outlasts conventional materials including other forms of Silicon Carbide in todays hostile manufacturing environments. The outstanding properties of our 99.999% pure monolithic Silicon Carbide material include high thermal conductivity, extremely low levels of impurities, low electrical resistivity, increased opacity and high resistance to chemical erosion. This material is excellent as a base material to make parts for various applications such as wafer carriers, susceptors, RTP edge rings, sputtering targets and heating elements for the semiconductor industry.
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Sputtering Targets

Sputtering Targets The Technical Ceramics business of Morgan Advanced Materials are specialists in the manufacture of ceramic sputtering targets for the semiconductor industry manufactured from 94%-99.99% alumina and CVD silicon carbide (SiC) for physical vapour deposition (PVD) applications. Our alumina sputtering targets are suited to a variety of applications including wear coatings, dielectric coatings and barrier coatings, whereas our CVD SiC sputtering targets are an excellent choice for the deposition of high-purity SiC thin films for demanding applications such as the manufacture of magnetic disk drive heads.
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