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Established in 2018, Vritra Technologies is dedicated to meet analytical equipment and research consumable requirements of scientific community and Industries across India.
Year of Establishment
2018
Primary Business
Retailer
Annual Turnover
Below Rs. 0.5 Crore Approx.
Market Covered
Scientific and Research Institutes, Industrial research,
high purity metal, alloy, ceramic, semiconductor and other customized sputter and pulsed laser deposition targets. Sputter targets are available with and without copper backing plate as required.targets can be customized in any dimensions.
Customized ITO & FTO coated glass/PET. To purchase kindly provide following details: Dimensions Resistivity Thickness Transparency
high purity single crystal substrate of mgo, gadolinium gallium garnet, lithium tantalate (litao3) , gallium oxide beta β -ga2o3 crystal , litao3 420y-cut, fe: srtio3 , zirconia (ysz), lanthanum aluminate (laalo3), niobium-doped strontium titanate (nb: srtio3), terbium gallium garnet (tgg), aluminum oxide (al2o3) crystal substrate, potassium tantalum (ktao3), strontium titanate (srtio3), lithium aluminate (lialo2), zinc selenide, srtio3, and many more. .
Customized high Purity silicon wafers, Si+SiO2 wafer, Silicon on Insultors wafers for industrial and research applications. Wafer are customized as per your requirements. Kindly provide details like orientation, doping etc for customization.
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