Shanghai Royal Technology Inc.

Balance/Unbalanced Closed Magnetic Filed Sputtering Coating System, Direct Plated Copper Vacuum Sputtering Plant

The Mangetron Sputtering Coater RTSP1215 is esigned for copper, alumunium, plastic, metal circuit board conductive film layer plating. It can condense Nano thin film on substrates. Except Ag sputtering, it can also deposit Ni, Au, Ag, Al, Cr, SS316L.

The RTSP1215 machine is installed with 2 pairs of MF sputtering cathodes on chamber, before PVD film deposition and 1 set of Anode Layer Ion source for plasma bombardment cleaning.

Ion source is original from Gencoa company, the properties:

1. Optimized magnetic fields to produce a collimated plasma beam at standard sputtering pressures

2. Automated regulation for the gas to maintain constant current & voltage multi-gas auto control

3. Graphite anode and cathode to protect the substrate from contamination and provide long-life components

4. RF standard electrical insulation on all ion sources

5. In-direct cooling of anode and cathode quick switching of parts

6. Easy switching of cathode parts to provide multiple magnetic traps for lower voltage operation, or a focused beam

7. Voltage regulated power supply with gas adjustment feedback to maintain same current at all times

RTSP1215 Sputtering Coating Equipment Design Features:

1.Robust design, good for limited room space

2.Easy access for maintenance and repair

3.Fast pumping system for high yield

4.CE standard electrical enclosure, UL standard is also available.

5.Accurate fabrication workmanship

6.Stable running to guarantee high quality film production.

Ceramic Sanitary Ware PVD Coating Equipmenttakes ion plating technology to evaporate solide metals like Titanium, Chrome by cathodic arc source and condense the ionized metals on product surface to generate the Nano thin film in high vacuum environment. With the reactive gas like: Nitrogen to generate various colors.


Ceramic Sanitary Ware PVD Coating Equipment Features:
1. Vacuum chamber is vertical one open door , 304 stainless steel manufactures, vacuum chamber internal diameter from 1400mm-2000mm;
2. Vacuum system by Rotary vane pump, Roots pump and Oil Diffusion Pumps or Molecular Pump Constitution;
3. Coating system uses 1-2 intermediate frequency magnetism to control the sputtering power source, has 1-2 pair of non-balanced magnetism to control the target, and has 14-40 arc sources.
4. High efficiency pulse bias power source;
5. The gasification system uses domestically produced or the import gaseous mass flowmeter, the gas flow amount control (demonstration) meter;
6. The electrically controlled system establishment electric circuit overloaded, cuts off the water supply, dies the acousto-optics alarm device;
7. Control system (touch-screen +PLC), real time display detailed parameter, completely automatic control entire production process, and automatic memory technological parameter.