yuhanchem

chongqing, China

This is ultra-pure hydrogen peroxide, with impurities less than 10 parts per trillion (ppt) and a purity greater than 99.999%/99.9999%.

Sold by China Yuhan Technology. If interested, please call or email us to request a CoA and product specifications.

• Assay (H2O2): 30.0% to 32.0%
• Color: APA 5
• Impurities: Various metal ions (e.g., Al, Sb, As) 0.05 ppb
• Total Organic Carbon (TOC): 20 ppm
• Particle Count:
  • 0.1 microns: 300 pcs/ml
  • 0.2 microns: 200 pcs/ml
  • 0.5 microns: 100 pcs/ml
  • 1.0 microns: 25 pcs/ml

• Chemical Name: Hydrogen Peroxide
• Hazardous Chemical Category: Class 5.1 (Oxidizing agent, corrosive, highly irritating)
• Appearance: Colorless transparent liquid, slightly irritating
• Melting/Freezing Point: -33C (-0.43C)
• Boiling Point: 108C (150.2C)
• Density: 1.11 g/cm (20C, 30% H2O2)
• pH Value: 1-4
• Solubility: Soluble in water, ethanol, ether; insoluble in benzene
• Stability: Stable under normal conditions
• Flammability: Non-flammable but a strong oxidizing agent

• Semiconductor Industry: Wafer cleaning, etching, removal of organic contaminants, oxidation process, lithography cleaning
• Electronics Manufacturing: High-purity etchants, Chemical-Mechanical Planarization (CMP)
• Chemosynthesis: Oxidizing agents in high-purity chemical production, synthesis of fine chemicals and pharmaceuticals
• Environmental Applications: Wastewater treatment, air purification, disinfection, sterilization
• Pharmaceuticals and Biotechnology: Sterilization, drug synthesis precursor

This is ultra-pure ammonia with less than 10 parts per trillion (ppt) of impurities and a purity exceeding 99.999%/99.9999%.

Sold by China Yuhan Technology. If interested, please call or email us to request a CoA and product specifications.

• Assay (NH3): 28.0% to 30.0%
• Color: APA 5
• Impurities:
  • Chloride (Cl): 0.01 ppm
  • Carbonate (CO3): 1 ppm
  • Sulfate (SO4): 0.01 ppm
  • Phosphate (PO4): 0.01 ppm
  • Reducing substance (permanganate in KMnO4): 0.5 ppm
• Metal Impurities (e.g., Al, Sb, As): 0.05 ppb
• Particle Count:
  • 0.1 microns: 200 pcs/ml
  • 0.2 microns: 50 pcs/ml
  • 0.5 microns: 30 pcs/ml
  • 1.0 microns: 10 pcs/ml

• Density: 0.88 g/cm at 20C
• Boiling Point: 36C (varies with concentration)
• Melting Point: -77C
• pH: Strongly alkaline (pH > 11)
• Solubility: Completely miscible with water, reacts with acids
• Decomposition: Releases ammonia gas (NH) over time, especially when heated

1. Ammonia Monohydrate (NHHO):
   • A weak base formed when ammonia dissolves in water.
   • Partially ionizes in water to form ammonium (NH) and hydroxide (OH) ions.
   • Corrosive, with a strong pungent odor, miscible with ethanol.
   • Unstable and decomposes to form ammonia and water.
2. Ammonia Water:
   • An aqueous solution of ammonia (NH), primarily composed of NHHO.
   • Contains ions NH, NH, OH, and HO.
   • Alkaline, weakly reducing, reacts with acids to form ammonium salts.
   • Forms white smoke when volatile ammonia meets acid mist.

• Semiconductor Industry:
  • RCA cleaning (SC-1) for removing organic matter and particle contamination from wafers.
  • Essential in etching and chemical-mechanical planarization (CMP) processes.
• Electronics Manufacturing:
  • High-purity alkaline etchants for microelectronics and display panels.
  • Key reagents in photoresist stripping.
• Chemistry and Drug Synthesis:
  • High-purity chemical formulations.
  • Precursors to ammonium-based compounds in research and industry.
• Environmental and Analytical Applications:
  • Ultrapure water production and wastewater treatment.
  • Reagents in ICP-MS and other trace analysis techniques.

This is ultra-pure sulfuric acid with less than 10ppt of impurities and a purity greater than 99.999%/99.9999%.

Sold by China Yuhan Technology. If interested, please call or email us to request a CoA and detailed product specifications.

• Assay (HSO): 96.0% to 97.0%
• Color: APHA 5
• Impurities:
  • Chloride (Cl): 50 ppb
  • Nitrate (NO): 0.1 ppm
  • Phosphate (PO): 0.1 ppm
  • NH: 1 ppm
  • Post-Ignition Residue (RAI): 1 ppm
  • Reducing substance (permanganate in KMnO): 1 ppm
• Metal Impurities (e.g., Al, Sb, As): 0.05 ppb
• Particle Count:
  • 0.1 microns: 200 pcs/ml
  • 0.2 microns: 50 pcs/ml
  • 0.5 microns: 30 pcs/ml
  • 1.0 microns: 10 pcs/ml

• Density: 1.84 g/cm at 20C
• Boiling Point: 290C (decomposes before boiling)
• Melting Point: 10C
• pH: Strongly acidic (pH < 1)
• Solubility: Completely miscible with water (exothermic reaction)
• Decomposition: Produces SO, SO, and HO at high temperatures
• High Purity: Extremely low impurity content to meet stringent requirements of microelectronics industries
• Appearance: Colorless transparent oily liquid
• Properties: Strong water absorption and oxidation; can dehydrate and carbonize carbohydrates; reacts with most metals

• Semiconductor Industry:
  • Critical for wafer cleaning and etching (SC-1 and SC-2 RCA cleaning)
  • Removes organic contaminants and metal residues from microchips
• Electronics Manufacturing:
  • High-purity etching solutions for PCBs and microfabrication
  • Essential in the Chemical-Mechanical Planarization (CMP) process
• Pharmaceutical and Chemical Synthesis:
  • High-purity reagents for precision chemical reactions
  • Catalyst in high-purity sulfuric acid-mediated synthesis
• Batteries and Energy Storage:
  • Essential for lithium-ion and lead-acid battery production
• Environmental and Analytical Applications:
  • For ICP-MS and trace metal analysis
  • Key reagents for ultrapure water production

• Vacuum Distillation: Distilled sulfuric acid is collected using vacuum distillation.
• Falling Film Crystallization:
  1. Crystallization Process: Cool the crystallizer to a constant temperature, add crystal seeds, and cool the feed acid and distilled acid at a certain rate.
  2. Sweating Process: Heat the crystallizer in steps to melt the crystal part and discharge as sweat.
  3. Melting Process: Increase the temperature to melt all crystals, yielding the product.

This is ultra-pure hydrofluoric acid, with less than 10ppt of impurities and a purity greater than 99.999%/99.9999%.

Sold by China Yuhanchemi . If interested, please call or email us to request a CoA and detailed product specifications.

• Detection (HF): 48.8% to 49.2%
• Color: APHA 10
• Impurities:
  • Nitrate (NO): 15 ppb
  • Chloride (Cl): 15 ppb
  • Phosphate (PO): 15 ppb
  • Sulfates and sulfites (SO and SO): 15 ppb
• Metal Impurities (e.g., Al, Sb, As): 0.05 ppb
• Particle Count:
  • 0.1 microns: 300 pcs/ml
  • 0.2 microns: 150 pcs/ml
  • 0.5 microns: 25 pcs/ml

• Density: 1.45 g/cm at 20C
• Boiling Point: Decomposes before boiling (150C at 1 atmosphere)
• Melting Point: -0.43C
• pH: Slightly acidic (pH of 4.55.5 for diluted solution)
• Solubility: Miscible with water, slightly soluble in alcohols and ethers
• Decomposition: Slowly decomposes into water and oxygen under heat, light, and impurities

• Semiconductor Industry:
  • Wafer cleaning processes (RCA cleaning)
  • Removal of organic and metal contaminants from microelectronics
• Pharmaceuticals and Biotechnology:
  • Sterilization of equipment and facilities
  • Synthesis of pharmaceutical intermediates
• Precision Electronics Manufacturing:
  • Etching process for printed circuit boards (PCBs)
  • Oxidizing agents in high-precision chemical reactions
• Chemical Synthesis:
  • Key reagents in oxidation reactions
  • Production of high-purity chemical intermediates
• Environmental Applications:
  • Wastewater treatment to remove contaminants
  • Advanced Oxidation Process (AOP) for air and water purification

1. Sulfuric Acid Method:
   • Mix dried fluorite powder and sulfuric acid in a ratio of 1:(1.21.3) and react in a rotary reactor at 280C 10C.
   • Distill and refine the crude hydrogen fluoride gas, then absorb with water to obtain hydrofluoric acid.
2. Distillation and Filtration:
   • Purify industrial-grade HF by distillation, condensation, and micro-porous filter membrane filtration to remove impurities and particles.
3. Gas Absorption:
   • Use hydrogen fluoride gas from cylinders, pass it through an absorber with conductive water to produce pure HF.
4. Chemical Purification:
   • Oxidize organic matter and sulfurous acid with potassium permanganate, then remove impurities with potassium carbonate or barium carbonate.
5. Raw Material Routes:
   • Fluorite and phosphate rock are common raw materials. The sulfuric acid method with fluorite is widely used.

• EL Grade: Metal impurities < 100 ppb, controlled 1 micron particles, suitable for small and medium-scale integrated circuits.
• UP Grade: Metal impurities < 10 ppb, controlled 0.5 micron particles, suitable for 1 micron integrated circuits and TFT-LCD manufacturing.
• UPS Grade: Metal impurities < 1 ppb, controlled 0.2 micron particles, suitable for 0.350.8 micron integrated circuits.
• UPSS Grade: Ppt level impurities, controlled 0.2 micron particles, suitable for advanced semiconductor manufacturing (0.090.2 micron processes).
• UPSSS Grade: Highest purity, ppt level impurities, suitable for the most advanced semiconductor processes.

This is ultra-pure nitric acid with less than 10ppt of impurities and a purity greater than 99.999%/99.9999%.

Sold by China Yuhan Technology. If interested, please call or email us to request a CoA and detailed product specifications.

• Assay (HNO): 69.0% to 70.0%
• Color: APHA 5
• Impurities:
  • Chloride (Cl): 80 ppb
  • Phosphate (PO): 50 ppb
  • Sulfate (SO): 100 ppb
• Metal Impurities (e.g., Al, Sb, As): 0.05 ppb
• Particle Count:
  • 0.1 m: 300 pcs/ml
  • 0.5 m: 50 pcs/ml
  • 1.0 m: 10 pcs/ml

• Density: 1.41 g/cm at 20C
• Boiling Point: 83C
• Melting Point: -42C
• pH: Strongly acidic
• Solubility: Completely miscible with water, reacts violently with organic solvents
• Decomposition: Releases NO gas when heated or exposed to light

• Nitric acid
• Fuming nitric acid
• Hydrogen nitrogen water
• Concentrated nitric acid
• Dilute nitric acid
• Nitrate water
• Hydrogen nitrate
• Nitric acid, 0.1N standard solution
• Nitric acid standard solution

• Semiconductor Industry:
  • Essential for wafer cleaning and etching processes
  • Used in RCA cleaning (SC-2) to remove metal contaminants
• Electronics Manufacturing:
  • High-purity oxidizers for circuit boards and components
  • Etchants in microfabrication and lithography
• Chemical Synthesis & Research:
  • Reagents in high-purity chemistry and drug synthesis
  • Precursor for nitrification reactions
• Metallurgy & Surface Treatment:
  • Passivation of stainless steel
  • Metal etching and refining
• Environmental & Analytical Applications:
  • Used in ICP-MS and other trace analysis techniques
  • For ultrapure water production

• G4, G5, G6 Series: Packaged in imported high-purity, corrosion-resistant fluoropolymeric resin PFA material.
• G1G3 Series: Packaged in high-density polyethylene bottles (HDPE).
• 500mL Products: Secondary packaged in PE bags with PET bottle outer protection for enhanced transportation safety.

• Other ultra-pure reagents can be customized. Detailed specifications can be discussed with our sales team.

• Physical Properties:
  • It has a relatively low boiling point of 82.45C and is highly volatile.
  • It is an excellent solvent and is miscible with water, ethanol, ether, chloroform, and many other organic solvents in any proportion.
  • Its density is 0.785 g/mL at 20C, making it a relatively light liquid with good fluidity.
• Chemical Properties:
  • It is highly reactive and can react with a variety of compounds, such as alcohols, ethers, esters, and amines.
  • It has strong hydrogen-bond donor and acceptor capabilities, making it highly reactive in chemical reactions.
  • It is stable under normal temperature and pressure conditions but should be kept away from oxidizing agents.

• Cleaning Agent: Widely used in cleaning applications for electronics, pharmaceuticals, and personal care products, effectively removing grease, dirt, and other organic substances.
• Solvent: Used extensively as a solvent in the coatings, inks, and adhesives industries to dissolve various resins, pigments, and other components.
• Disinfectant: In the medical field, isopropanol is commonly used for disinfecting and cleaning medical instruments.
• Pharmaceutical Industry: In the pharmaceutical industry, isopropanol is used to synthesize a variety of drug intermediates.

• Isopropanol is volatile and has a pungent odor, so it should be stored in a cool, well-ventilated environment.
• Appropriate safety measures, such as wearing protective gloves and goggles, should be taken when using it.

• cas no.13889-96-8
• chemical namecarbonochloridothioic acid, 5-octylester
• synonymseinecs 237-658-5; octyl thiochloroformate; s-octylthiochloroformate; s-octyl chlorothioformate; carbonochloridothioic acid; chlorthioameisensaeure-s-octylester; carbonochloridothioicacid, s-octylester; chloridothiocarbonic acid s-octyl ester; carbonochloridothioic acid, 5-octylester; carbonochloridothioic acid, 5-octylester iso 9001:2015 reach
• cbnumbercb0268082
• molecular formulac9h17clos
• molecular weight208.75
• mdl numbermfcd01075162
• mol file13889-96-8.mol
• last updated2023-05-04 15:13:13

company name: yuhan chemi

focus: import and export in india

about us: yuhan chemi is a chemical supplier specializing in import and export in india. we are committed to providing customers with high-quality chemicals and customized solutions. our products are widely used in the chemical, pharmaceutical, and materials industries. we have a professional technical team and a comprehensive supply chain system to ensure product quality and stable supply. we welcome long-term and stable partnerships with partners around the world to jointly promote industry development.

We have many pharmaceutical intermediates and fine chemicals that are in short supply in India. Indian suppliers are welcome to contact us.

• English Name: 3-Aminobenzoic Acid
• CAS Number: 99-05-8
• Molecular Formula: C7H7NO2
• Molecular Weight: 137.14
• EINECS Number: 202-724-4
• Appearance and Physical State: White or pale yellow needle-like crystals, sweet taste
• Melting Point: 173-174C
• Boiling Point: 352.5C
• Relative Density: 1.511
• Flash Point: 150C
• Solubility: Soluble in acetone, soluble in boiling water, hot ethanol, hot chloroform, and ether, slightly soluble in cold water, cold ethanol, and cold chloroform, insoluble in benzene and gasoline
• Usage: Mainly used as a pharmaceutical intermediate and dye intermediate, for the manufacture of azo dyes, iodo-benzoic acid, and cholecystographic acid, also used as an analytical reagent

• Hazard Summary:
  • Health Hazard: Irritating to eyes, skin, and upper respiratory tract
  • Environmental Hazard: Harmful to the environment, especially to water bodies
  • Flammability and Explosion Hazard: Combustible, with irritating properties
• Safety Recommendations:
  • In Case of Contact with Eyes: Immediately rinse thoroughly with plenty of water and seek medical advice
  • Personal Protection: Wear appropriate gloves and eye/face protection