Yuhan Hydrofluoric Acid for Industrial

Ultra-Pure Hydrofluoric Acid Overview

This is ultra-pure hydrofluoric acid, with less than 10ppt of impurities and a purity greater than 99.999%/99.9999%.

Sold by China Yuhanchemi . If interested, please call or email us to request a CoA and detailed product specifications.

• Detection (HF): 48.8% to 49.2%
• Color: APHA ≤ 10
• Impurities:
  • Nitrate (NO₃): ≤ 15 ppb
  • Chloride (Cl): ≤ 15 ppb
  • Phosphate (PO₄): ≤ 15 ppb
  • Sulfates and sulfites (SO₃ and SO₄): ≤ 15 ppb
• Metal Impurities (e.g., Al, Sb, As): ≤ 0.05 ppb
• Particle Count:
  • ≥ 0.1 microns: ≤ 300 pcs/ml
  • ≥ 0.2 microns: ≤ 150 pcs/ml
  • ≥ 0.5 microns: ≤ 25 pcs/ml

• Density: ~1.45 g/cm³ at 20°C
• Boiling Point: Decomposes before boiling (~150°C at 1 atmosphere)
• Melting Point: -0.43°C
• pH: Slightly acidic (pH of 4.5–5.5 for diluted solution)
• Solubility: Miscible with water, slightly soluble in alcohols and ethers
• Decomposition: Slowly decomposes into water and oxygen under heat, light, and impurities

• Semiconductor Industry:
  • Wafer cleaning processes (RCA cleaning)
  • Removal of organic and metal contaminants from microelectronics
• Pharmaceuticals and Biotechnology:
  • Sterilization of equipment and facilities
  • Synthesis of pharmaceutical intermediates
• Precision Electronics Manufacturing:
  • Etching process for printed circuit boards (PCBs)
  • Oxidizing agents in high-precision chemical reactions
• Chemical Synthesis:
  • Key reagents in oxidation reactions
  • Production of high-purity chemical intermediates
• Environmental Applications:
  • Wastewater treatment to remove contaminants
  • Advanced Oxidation Process (AOP) for air and water purification

1. Sulfuric Acid Method:
   • Mix dried fluorite powder and sulfuric acid in a ratio of 1:(1.2–1.3) and react in a rotary reactor at 280°C ± 10°C.
   • Distill and refine the crude hydrogen fluoride gas, then absorb with water to obtain hydrofluoric acid.
2. Distillation and Filtration:
   • Purify industrial-grade HF by distillation, condensation, and micro-porous filter membrane filtration to remove impurities and particles.
3. Gas Absorption:
   • Use hydrogen fluoride gas from cylinders, pass it through an absorber with conductive water to produce pure HF.
4. Chemical Purification:
   • Oxidize organic matter and sulfurous acid with potassium permanganate, then remove impurities with potassium carbonate or barium carbonate.
5. Raw Material Routes:
   • Fluorite and phosphate rock are common raw materials. The sulfuric acid method with fluorite is widely used.

• EL Grade: Metal impurities < 100 ppb, controlled 1 micron particles, suitable for small and medium-scale integrated circuits.
• UP Grade: Metal impurities < 10 ppb, controlled 0.5 micron particles, suitable for 1 micron integrated circuits and TFT-LCD manufacturing.
• UPS Grade: Metal impurities < 1 ppb, controlled 0.2 micron particles, suitable for 0.35–0.8 micron integrated circuits.
• UPSS Grade: Ppt level impurities, controlled 0.2 micron particles, suitable for advanced semiconductor manufacturing (0.09–0.2 micron processes).
• UPSSS Grade: Highest purity, ppt level impurities, suitable for the most advanced semiconductor processes.