Memsstar’s Orbis dry release etch process tools are available using vapor Hydrogen Fluoride (HF) andXenon DiFluoride (XeF2) chemistries. Available in variants Alpha, 1000 and 3000. The new generation of ORBIS platforms enable the most...
Memsstar’s XERIC dry release etch process module is available using vapor Hydrogen Fluoride (HF) andXenon DiFluoride (XeF2) chemistries. Offers solutions for commercial R&D through to full-scale high volume manufacturing. XERIC Etch process...
Memsstar’s XERIC dry release etch process module is available using vapor Hydrogen Fluoride (HF) andXenon DiFluoride (XeF2) chemistries. Offers solutions for commercial R&D through to full-scale high volume manufacturing. XERIC Etch process...
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