Asymmetric Bipolar Pulsed Power Supplies

We are offering Asymmetric Bipolar Pulsed Power Supplies for Sputtering Systems.
Asymmetric Bipolar Pulsed DC power supplies are based on the technique of adding a reverse voltage bias pulse to the normal DC waveform. Pulse frequency and duty cycle can be varied to optimize the process for a specific cathode target material and ultimately, the relevant properties of the deposited films.
IONICS has developed asymmetric bipolar pulsed power supplies for sputtering applications. In addition to the standard voltage and current controls, the frequency and the pulse width can also be controlled in these power supplies.