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Contact SupplierWe offer synopex cmp filter has been developed for the cmp process of semiconductor manufacturing process. This filter product has been designed to remove large particles which might generate defect on the wafer surface by passing working slurry particles through. Especially, it has a gradient structure of multi-layer which can remove different size of particles by each layer to reduce the initial blockage in the filter and thus to improve the long time life span of filter.
- expanded slurry life and supplying constant slurry flow
- remove large particles which cause damage on the wafer surface.
- possible for high flow rate with wide filter surface area.
- multi layer gradient (gradient structure)
- pure polypropylene material without adhesives or organic binders