Listing ID #7313123
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Contact SupplierCOMPACT DC MAGNETRON SPUTTERING COATER is designed to make some metal films,the film area can be up to 4 inches.It has a 2 inch size and the height between the sample stage and the sputter head can be adjusted between 30 and 80 mm. A manually operable sputter baffle is installed for pre-sputtering. The sputtering time of the sputtering head can be adjusted between 1 and 120 s. If you want a thin film, the sputtering time can be set shorter; if you want a thick film, the sputtering time can be longer.The device is small in size and cost-effective. It is an ideal coating equipment for making various metal films. It can be equipped with various metal targets and vacuum pump.
Feature | 1.Specially Designed for coating conductive gold film for SEM sample. 2.Compact plasma sputtering coater designed for metallic coatings, such as gold, platinum, and silver. 3.One 2″ gold (4N) target is included. |
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Input Voltage | 220 VAC 50/60Hz, 200W < 1000 W (including vacuum pump power) 110VAC power is available by using a 1000 W transformer (15 A fuse). The transformer is sold separately. |
Output Voltage | 500 VDC |
Sputtering current | 0 – 50 mA (max.) adjustable sputtering current Digital current meter (mA) Over-current protection |
Sputtering time | 1 -120 seconds adjustable |
Specimen Chamber | Quartz glass tube, 165 mm OD.×150 mm ID×150 mm Height |
Specimen Stage | 2″ diameter,height adjustable, 30 – 80 mm from the sample to the target |
Sputtering Head | 2″ magnetron sputtering head.One manually operated shutter for target protection. |
Vacuum Pressure | Digital vacuum pressure meter (Pa) KF25 vacuum pump connector Ultimate vacuum pressure 1 Pa by the mechanical pump. The Pump is not included. |
Input gas | One 1/4 Swagelok type tube fitting is installed for connecting the inert gas cylinder. One metering valve is in the front panel for adjusting the input gas. |
Target | One 50mm Dia. x 0.12mm gold target is included. 4N purity gold foil: 50 mm(2 inch) Dia. x 0.12 mm (Included and pre-installed on coater) Optional Targets are available Au target (50 mm Dia.×0.12 mm, 4N purity) Pt target (50 mm Dia.×0.12 mm, 4N purity) Ag target (50 mm Dia.×0.5 mm, 4N purity) This model is suitable for coating Gold, Sliver, Platinium. And it is not suitable for coating light metallic material such as Al, Mg, Zn, or Carbon target due to low energy. Please consider our high power DC/RF magnetron sputtering coater or thermal evaporation coater. |
Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.
We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it\'s Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.
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Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.
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Our service range
We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.
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Why us?
Providing reliable and trustworthy products
Equipped with highly knowledgeable staff
Having multiple ranges of products
Transparent pricing structure
Providing online support as well