Cvd Tube Furnace For Graphene Thin Film Research

We are offering cvd tube furnace.
Description of the cvd tube furnace：
the system is widely used for various cvd experimental reaction temperature at 1100 ℃, it can also be used for vacuum sintering,vacuum protective atmosphere sintering nanomaterials preparation,battery materials preparation and other research field.
Specification of the cvd tube furnace:
outstanding features.
1.split chamber for fast cooling and fast heating.
2.touch screen interactive mode.
3.uniform temperature.
Technical parameters
model cy-o1200-80it
chamber type open type
display mode lcd
limiting temperature 1200℃
working temperature â‰Â¤1150℃
heating rate â‰Â¤20℃(suggestion:10℃min)
heating element aludirome
heating zone single
heating zone length 440mm
furnace tube material high purity quartz
furnace tube diameter 60mm
the furnace tube length 1000mm
gas tightness vacuum flange and corundum furnace tube up to 4.03×10-3pa
control mode pid temperature control
temperature accuracy ±1℃
thermal couple k type
working voltage ac 110-480v 50hz～60hz
rated power 2.5kw
the flow meter float flowmeter or mfcs
pneumatic pressure -0.1～0.15 mpa
warranty 12 month (exclusive wearing part)