Listing ID #7313001
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DUAL CHAMBER PULSE LASER COATER is used for growing optical crystals, ferroelectrics, ferromagnets, superconductors and organic compound thin film materials, suitable for growing high melting point, multi-elements and complex layered superlattice thin film materials containing gas elements. It is widely used in the research and manufacture of thin film materials in colleges and universities.
| Main vacuum system | Sphere structure, size:Ø 450mm | |
|---|---|---|
| Loading sample system | Vertical cylindrical stucture, size: Ø 150×150mm | |
| Vacuum system configuration | Main vacuum chamber | Mechanical pump, molecular pump, valve |
| Loading sample system | Mechanical pump and molecular pump(sharing with primary chamber), valve | |
| Ultimate pressure | Main vacuum system | ≤6*10-6Pa(after baking and degassing) |
| Loading sample system | ≤6*10-3 Pa(after baking and degassing) | |
| Vacuum recovery system | Main vacuum system | It can reach 5×10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
| Loading sample system | It can reach 5×10-3Pa in 20 minutes (the system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) | |
| Rotating target platform | The maximum size of the target is about 60mm. Four target materials can be installed at one time, target changing in revolution motion; each target can rotate independently, rotation speed: 5-60 rpm | |
| Substrate heating platform | Sample size | Ø51 |
| Mode of motion | Substrate rotates continuously, rotation speed:5-60 rpm | |
| Heating temperature | Maximum temperature of substrate heating: 800℃±1℃, Controlled and adjustable | |
| Gas circuit system | 1-circuit mass flow controller, 1-circuit inflation valve | |
| Optional accessories | Laser device | Compatible with coherent 201 laser |
| Laser beam scanning device | 2D scanning mechanical platform, perform two degree of freedom scanning. | |
| Computer control system | The contents of control include common conversion target, target rotation, sample rotation, sample temperature control, laser beam scanning, etc. | |
| Space occupied | Main unit | 1800 * 1800mm2 |
| Electric cabinet | 700 *700mm2(one） | |
Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.
We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it\'s Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.
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Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.
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Our service range
We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.
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Why us?
Providing reliable and trustworthy products
Equipped with highly knowledgeable staff
Having multiple ranges of products
Transparent pricing structure
Providing online support as well
Nature of Business
Manufacturer / Exporter / Supplier
Number of Employees
20 - 50
Year of Establishment
2013
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