Horizontal Magnetron

HHV has designed and developed an In-line Horizontal Magnetron sputtering system for commercial applications to handle substrate of size 1.0 m x 1.0 m. The multi-chambered DC magnetron system consists of entry and exit load lock chambers, isolation chambers and process chambers.
The substrate is introduced into the process system horizontally through specially designed vacuum compatible conveyor belts, which minimises the sagging effect. A substrate heating mechanism is provided with radiative heaters and reflectors to effectively concentrate the heat energy on to the substrate surfaces, which ensures the minimum loss of energy.