Silicon Low Pressure Diffusion System

Low-pressure diffusion is currently considered to be an effective way to effectively improve the conversion efficiency of solar cells. Low-pressure diffusion is currently considered to be an effective way to effectively improve the conversion efficiency of solar cells. Low-pressure diffusion/scattered oxidation annealing improves the molecular free path of the diffusion source and solves the problems of diffusion depth and uniformity; compared with atmospheric pressure diffusion, it has some significant advantages, such as high productivity, high square resistance, process repeatability, Low source consumption, clean and environmentally friendly, etc. This equipment is mainly used for the diffusion doping and oxidation annealing process of silicon wafers in the manufacture of crystalline silicon solar cells. Main Features Mature high-capacity process, loading and unloading system: balanced and symmetrical design to enhance stability; Rapid cooling furnace body: The latest patented technology makes the furnace body temperature drop to the required temperature quickly, the cooling rate is increased by more than 25%, which can improve the temperature uniformity in the furnace tube obviously; The exhaust gas is collected by high-efficiency water-cooled condenser to ensure stable and reliable operation of pipes, valves, filters and diaphragm pumps and long maintenance periods; Stable design of anti-interference source pipeline to reduce square resistance fluctuation caused by disturbance of environmental factors; MES/CCRM system with complete architecture and outstanding performance.