Lpcvd Coating Machine

It is suitable for semiconductor and photovoltaic fields. For TOPCon process cells in the photovoltaic field, LPCVD equipment can complete the preparation of tunnel oxide layer/poly layer in one stop. The combination of thermal oxygen and poly layer depos
It is suitable for semiconductor and photovoltaic fields. For TOPCon process cells in the photovoltaic field, LPCVD equipment can complete the preparation of tunnel oxide layer/poly layer in one stop. The combination of thermal oxygen and poly layer deposition can greatly increase production capacity, while compatible with i/d-Poly growth process.
Main Features
Mature high-capacity process, dual-mode temperature control technology, film gauge protection technology;
With a variety of coating technologies: multi-layer composite film, doped polysilicon technology;
Patented rapid cooling furnace body: The latest patented technology makes the furnace body temperature drop to the required temperature quickly, and the cooling rate can be increased by more than 25%, which can improve the temperature uniformity in the furnace tube obviously;
Fast adaptive pressure closed-loop control technology;
MES/CCRM system with complete architecture and outstanding performance;
Integrated industrial computer + Modular process control software;
Comprehensive power failure safety treatment and abnormal protection of flange water.