Microwave Plasma Sources

Mks designs and manufactures rf torroidal and microwave plasma sources to energize and dissociate gases. Fluorine based gases such as nf3 are used to clean unwanted deposits from the walls of vacuum process chambers. Plasma sources for process chemistries include oxygen, nitrogen, and hydrogen.
Mks offers a complete spectrum of ultra clean, highly reliable ozone generation, delivery and accessory products. The ozone product family includes compact, high concentration ozone generators, closed-loop controlled ozone gas delivery subsystems, state-of-the-art, high concentration dissolved ozone liquid delivery subsystems and ozone accessories for flow mixing and ozone destruction.