Listing ID #7312804
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Contact SupplierNST 3 HEADS COMPACT RF PLASMA MAGNETRON SPUTTERING COATER is mainly used to make non-conductive films, especially some oxide films.It is the most cost-effective coater for researching in the new generation of oxide thin films.
Input Power | Single phase 220 VAC, 50 / 60 Hz 1000 W (including vacuum pump and water chiller) If the voltage is 110 V, a 1500 W transformer can be ordered at our company |
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Power Source | 13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads Load range: 0 – 80 Ω adjustable. Tuning range: -200j – 200j adjustable The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” (no breaking of vacuum and plasma during a multilayer process) With a DC power supply, the coater can be easily modified into 1” DC sputtering sources for metallic film deposition, enabling three DC, one RF / two DC, and two RF / one DC sputtering head configurations |
Magnetron Sputtering Head | Three 1″ magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps One manually operated shutter is built on the flange One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads |
Sputtering Target | Target size requirement: 1″ diameter×1/8″ thickness max Sputtering distance range: 50 – 80 mm adjustable Sputtering angle range: 0 – 25° adjustable 1″ diameter Cu target and Al2O3 target are included for demo testing |
Vacuum Chamber | Vacuum chamber: 256 mm OD×238 mm ID×276 mm Height, made of high purity quartz Sealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring Stainless steel shield cage is included for 100% shielding of RF radiation from the chamber Max vacuum level: 1.0E-5 Torr with optional turbo pump and chamber baking |
Sample Holder | Sample holder is a rotatable and heatable stage made of ceramic heater with stainless steel cover Sample holder size: 50 mm Dia. for. 2″ wafer max Rotation speed: 1-10 rpm adjustable for uniform coating The holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +/- 1.0 °C via a digital temperature controller |
Vacuum Pump | KF40 vacuum port is built in for connecting to a vacuum pump. Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump |
Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.
We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it\'s Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.
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Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.
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Our service range
We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.
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Why us?
Providing reliable and trustworthy products
Equipped with highly knowledgeable staff
Having multiple ranges of products
Transparent pricing structure
Providing online support as well