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    Nst 5 Heads RF Plasma Magnetron Sputtering Coater Machine

    ₹ 5.50 Lakh - ₹ 15.50 Lakh / piece
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    • MaterialMild Steel
    • FinishingPolished
    • Driven TypeElectric
    • SpecialitiesRust Proof, Long Life, High Performance, Easy To Operate, Ruggedly Constructed,Less Maintenance
    • Supply TypeManufacturer, Exporter, Supplier
    • Preferred Buyer Location All over the world
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    Company Information

    location Dadri, Gautam Buddha Nagar, Uttar Pradesh
    4.2/5fill iconfill iconfill iconfill iconhalf icon(5)
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    • calendar Member Since 9 Years
    • building Nature of Business Manufacturer
    • gst icon GST No. 09ARCPD4541L1ZS

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    • Product Details

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    • Brand NameNST
    • MaterialMild Steel
    • FinishingPolished
    • Driven TypeElectric
    • ConditionNew
    • CertificationISO 9001:2015
    • Country of Origin220V
    • SpecialitiesRust Proof, Long Life, High Performance, Easy To Operate, Ruggedly Constructed,Less Maintenance
    • PhaseSingle Phase
    • Total Carbohydrate1 Year
    • Input Power220 VAC, 50 / 60 Hz
    • Wattage1000 W (including vacuum pump and water chiller)
    • Net Weight60 Kg

    CUSTOMIZED 5 HEADS NST PLASMA MAGNETRON SPUTTERING COATER is particularly suitable for exploring solid electrolyte materials, combined by 5 different elements in 16 different ratios.This equipment is mainly used to make an oxide film on a single crystal substrate, so there is no need for a high vacuum environment.

     


    Details

    Features5 magnetron sputtering guns for 5 different target materials
    Depending on the power supplies used (RF or DC), both metallic and non-metallic materials can be deposited.
    Capable of sputtering 5 target materials to produce various  compositions via different sputtering times / rates
    With optional 5 power supplies, 5 target materials can be sputtered at the same time for combinatorial sputtering
    16 samples can be deposited in one batch with a mask and a rotating sample holder
    Input PowerSingle phase 220 VAC, 50 / 60 Hz
    1000 W (including vacuum pump and water chiller)
    Power SourceOne 13.5 MHz,300 W auto-match RF generator is included and connected to the sputtering heads
    The rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” without breaking of vacuum during a multilayer process.
    Multiple RF power supplies are optional, which allows user to sputter multi-target at the same time for combinatorial sputtering
    Laptop with control software is available at extra cost to control each RF gun’s sputtering time and power
    Magnetron   Sputtering HeadFive 1″ magnetron sputtering heads with water cooling jackets are included and inserted into quartz chamber via quick clamps
    One manually operated shutter is built on the flange
    One 10 L/min digitally controlled recirculating water chiller is included for cooling sputtering heads
    Sputtering   TargetTarget size requirement: 1″ diameter×1/8″ thickness max
    Sputtering distance range: 50 – 80 mm adjustable
    Sputtering angle range: 0 – 25° adjustable
    1″ diameter Cu target and Al2O3 target are included for demo testing
    Vacuum Chamber
     
    Vacuum chamber is made of 304 stainless steel with reinforcing rib
    Inside vacuum chamber size: 470 mm L×445 mm D×522 mm H  (~105 Liters, 18.5“×17.5″× 20.5″)
    Round 380 mm Dia. hinged type door with 150 mm Dia glass window
    Temperature range: -15 to 150 °C
    Vacuum level: 4.0E-5 torr with turbo pump
    Sample Holder
     
    150 mm diameter rotatable sample holder for coating 16 sample one one batch with different compositions
    Sample holder and mask rotation can be controlled manually by a button or automatically by a control software (Optional)
    The sample holder temperature is adjustable from RT to 600 °C max
    Vacuum PumpKF40 vacuum port is built in for connecting to a vacuum pump.
    A compact turbo pump is included
    4.0E-5 Torr with optional turbo pump























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