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NST Dual Target RF Magnetron Sputtering Coater

Listing ID #7313059

5.50 Lakh - 18.50 Lakh / piece
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  • MOQ 1 Piece
  • FinishingPolished
  • Country of OriginIndia
  • Supply VoltageAC220V, 50Hz
  • Total WeightAbout 300 Kg
  • Supply Type Manufacturer, Exporter
Preferred Buyer From : All over the world
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Company Information

  • Member Since 8 Years
  • Nature of Business Supplier
  • Year of Establishment 2013

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Product Details no_img_icon

  • Finishing Polished
  • Country of Origin India
  • Supply Voltage AC220V, 50Hz
  • Total Power 2.5 kW
  • Feature Easy To Use, Long Life, Strong Structure, Sturdiness
  • Total Weight About 300 Kg
  • Model Number NST MSP300S-2RF-2FG
  • Overall Size 600mm × 650mm × 1280mm
  • Max Output Power RF 300 W

DUAL TARGET RF MAGNETRON SPUTTERING COATER is equipped with 300W power supply and 500W DC power supply. The DC power supply can be used for the preparation of metal film, and the power supply can be used for the preparation of non-metal films. The two targets can meet the needs of multi-layer coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.

 

The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.

 

In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process. If customers need to install multiple film thickness gauges, also can contact our technical staff for customization.

 

This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

 

Dual-target magnetron sputtering coater application:

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.


Technical Specifications

Sample stage Size φ185mm Temperature control accuracy ±1℃
Heating temperature Max 500℃ Rotate speed 1-20rpm adjustable
Magnetron Sputtering   target head Quantity 2”×2 (1”,2” optional) Water chiller Circulating water chiller   with flow rate of 10L/min
Cooling mode Water cooling    
Vacuum chamber Chamber size φ300mm×300mm Watch window φ100mm
Chamber material Stainless steel Opening mode Top cover open
Mass flowmeter 2 channels; measuring range 100sccm; 100sccm (can be customized according to customer needs)
Vacuum system Model NST-GZK103-A Pumping interface KF40
Molecular pump NST-600 Exhaust interface KF16
Backing pump rotary vane pump Vacuum measurement Compound vacuum gauge
Ultimate vacuum 1.0E-5Pa Power supply AC;220V 50/60Hz
Pumping rate Molecular pump:   600L/S   rotary vane pump: 1.1L/S
Comprehensive gas pumping performance:   vacuum up to 1.0E-3Pa in 20 minutes
Power configuration Quantity NST power supply×2 Max output power RF 300 W

Additional Information

  • Payment Terms L/C, T/TWestern Union
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Company Details close-icon

Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.

We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it\'s Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.

 

Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.

 

Our service range

We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.

 

Why us?

Providing reliable and trustworthy products

Equipped with highly knowledgeable staff

Having multiple ranges of products

Transparent pricing structure

Providing online support as well

  • Nature of Business Manufacturer / Exporter / Supplier
  • Number of Employees 20 - 50
  • Year of Establishment 2013
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