Listing ID #7312866
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SINGLE CHAMBER MAGNETRON SPUTTERING SYSTEM is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research of thin film materials and the production of small batch. It can be widely used in universities and colleges, scientific research institutes of thin film materials preparation research and small batch.
| Vacuum chamber | Circular type vacuum chamber, size: Ø450×350mm |
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|---|---|---|
| Vacuum system configuration | Compound molecular pump, mechanical pump, gate valve | |
| ultimate pressure | ≦6.67*10-5Pa(After baking degassing) | |
| Vacuum recovery time | Up to 6. 6*10-4Pa in 40 minutes. (the system briefly exposes the atmosphere and fills with dry nitrogen to start pumping) | |
| Magnetron target component | 3 sets of permanent magnetic targets; target sizeØ60mm(one of the targets can sputtering ferromagnetic material). The RF beach and DC cutoff of each target are compatible; and the distance between target and sample is adjustable from 90mm to 100mm; when direct upward sputtering, the distance between target and samle is adjustable from 40mm to 80mm. | |
| Water-cooling Substrate Heating Revolution Table | Substrate Structure | The substrate heating and water cooling work independently, and the heating furnace can be replaced by water cooling substrates |
| Sample size | Ø30mm | |
| Mode of motion | The substrate can rotate continuously, and the rotation speed is 5-10 RPM | |
| Heating | Max. Temperature 600℃±1℃ | |
| Substrate Negative Bias | -200V | |
| Gas Circuit System | 2-way Mass Flow Controller(MFC) | |
| Optional parts 6 station base plate heating revolution table | Removing the single substrate, The water heating platform can be replaced on the rotary table. 6 sheets of 30mm substrates can be placed simultaneously; Among the six stations, one of them is installed with heating furnace, while the rest are natural cooling substrates. Maximum temperature of substrate heating: 600℃±1℃ | |
| Computer Control System | Control sample rotation, baffle switch, target identification, etc | |
| Floor Occupied | Main Set | 1300×800mm2 |
| Electrical Cabinet | 700×700mm2 | |
Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.
We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it\'s Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.
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Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.
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Our service range
We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.
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Why us?
Providing reliable and trustworthy products
Equipped with highly knowledgeable staff
Having multiple ranges of products
Transparent pricing structure
Providing online support as well
Nature of Business
Manufacturer / Exporter / Supplier
Number of Employees
20 - 50
Year of Establishment
2013
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