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he Raider M is an automated, high-performance single-wafer ECD system. It features a precision, fully automated wafer handling system coupled with individual process chambers and is compatible with automated chemical management systems. Processes and recipes developed on the Raider M plaform are directly transferable to the high volume manufacturing Raider GT ECD system, making the move from R&D to full production seamless and immediate.
Advanced metal deposition chambers
One or two process chambers
150, 200, or 300mm wafer sizes
Built to SEMI S2S8 guidelines
Mini-environment with ionization
Open cassette, SMIF, and FOUP load stations
Small footprint (
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