Zno Sputtering Target

We are offering zno sputtering target
grade:99.99%
chemical composition:
1.zno target, purity (wt%) 99.99% min
2.impurity content: unit ppm
element fe cu pb cd ni mn k na ca sb mg si
content 8 5 9 6 9 5 5 4 3 6 5 8
density:
1.density of target: 5.5gcm3 min
2.relative densityof target: 98% min
target color: pale yellow
shape: squareround, according to your request
max size: 400mm; 400ã� 250ã� 15mm or as customer'request.
Customization is available
application:
zinc oxide target is a good semiconductor materials, which are widely used in: liquid crystal display, thin film transistor, diodes, thin film solar cells, etc.