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Chemical Machine

Our product range contains a wide range of Chemical Vapour Deposition Systems

Chemical Vapour Deposition Systems

QrystalTMis a research grade chemical vapour deposition system, with12 independent temperature zones, each capable of reaching temperaturesupto 1150C. It has an inbuiltprecision mass flow controllerallowing controlled injection ofupto 4 gases. Aback pressure regulatorallows a fixed controlled pressure to be maintained throughout the deposition chamber.

Furnace : QBAKE-1100-3
  • Independent Heating Zones : 12
  • Maximum Temperature : 1150C for transient, 1100C for continuous operation
  • Uniform Temperature Zone Length : 200 mm
  • Temperature Uniformity : Better than5C within a zone
  • Heater Wire Material : Kanthal
  • Process Tube Material : Quartz
  • Process Tube Diameter : ID = 45 mm, OD = 48 mm
  • Embedded Temperature Sensor : K-type Thermocouple
Temperature Controller : TCON-12
  • Sensor Channels : 16
  • Sensor Type : K-type Thermocouple (or PT100)
  • Independent Control Loops : 12
  • Control Algorithm : Floating Point P-I-D
  • Temperature Stability : Better than 0.1C
  • PID Auto-tune : Yes
  • Heater Drive : 220V, 50 Hz
Vacuum System : VAC-10E-2
  • Pump Type : 2-stage, Rotary Pump
  • Pump Throughput : 15 m3/hour
  • Ultimate Vacuum : 10m-3mBar
  • Vacuum Sensor : Pirani Gauge and15 psi tube pressure sensor mounted at the end of the quartz tube
  • Chamber Isolation : Butterfly Valve
Mass Flow Controller : MF02
  • Number of Channels : 4
  • Channel 1, 2 : 0-1000 sccm
  • Auxilliary Valves : 2/channel, one in series for true shutoff, one in parallel for flushing
  • Flow Stability : Better than 0.1% of full scale
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