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We offer the best product range of Metal Chemical Vapor Deposition System.
Valence Process Equipment offers both production and research-sized MOCVD reactor systems for Group III-Nitride and InGaAl-AsP material systems. We can provide a high degree of customization to suit your specific process requirements.
Valence Process Equipment patented, 500-series platform features a non clogging, temperature-controlled showerhead gas injector, and our high symmetry, minimized-volume, non-recirculating pro led reactor, enabling production-level capacities with pilot-level gas and MO usage. Along with high speed wafer carrier rotation, rapid heating capability to 1200C, and high-velocity, uniform- fluid gaps providing efficient heat removal and uniform wall temperatures, the 500-series provides state-of-the-art epitaxial materials properties and uniformities at unbeatable efficiencies.
CAPACITY SPECIFICATIONS:250- series capacity10x2in, 5x3in, 3x4in, 1x6in, 1x8in500-series capacity72x2in, 20x4in, 7x6in, 4x8in
FACILITY SERVICES:208 and 380 VAC, 3- Phase PowerPurified N2, H2, and NH3 GasesCooling Water Recirculation LoopCabinet and Exhaust Ventilation
MATERIAL SPECIFICATIONS:GaN, InGAN, AIGaN, AIN2 in., 3 in., 6 in., 8 in. SubstratesSapphire, Silicon, Silicon Carbide.
TESSCORN NANO SCIENCE INC. (TESSCORN NANO SCIENCE INC.)
1285, 5th Main, 17th Cross
HSR Sector 7
Bangalore 560068, HSR Layout, Karnataka
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