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Nst 300-2hd Dual Target Magnetron Sputtering Coater

Listing ID #7312748

  • MOQ 1 Piece
  • FinishingPolished
  • FeatureEasy To Use, Long Life, Strong Structure, Sturdiness
  • TypeSputtering Target
  • Country of OriginIndia
  • Supply Type Manufacturer, Exporter
Preferred Buyer From : All over the world
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Company Information

  • Member Since 8 Years
  • Nature of Business Supplier
  • Year of Establishment 2013

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Product Details no_img_icon

  • Finishing Polished
  • Feature Easy To Use, Long Life, Strong Structure, Sturdiness
  • Type Sputtering Target
  • Country of Origin India
  • Model Number 300-2HD
  • RF Sputtering Power 300W / 500W (Optional)
  • The Number of Target Guns 1
  • Power Supply Voltage 220V, 50 Hz
  • Working Vacuum Degree 10-4Pa

300-2HD DUAL TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and ceramic. Film, dielectric film, optical film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.


Technical Specifications

Name Dual target magnetron sputtering coater
Model 300-2HD
Installation   conditions This   equipment is required to be used at the altitude of 1000m or less, the   temperature of 25℃±15℃,   and the humidity of 55% Rh ± 10% Rh.
1.   Water: The equipment is equipped with a self-circulating chiller (filling   pure water or deionized water)
2.   Electricity: AC220V 50Hz, must have a good ground connection.
3.   Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double ferrule   joint) and pressure reducing valve
4.   Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg
5. Ventilation device: need
Main features 1.   Configure two target guns, A matching RF power supply is used for sputter   coating of non-conductive targets, and a matching DC power supply is used for   sputter coating of conductive materials.
2.   It can prepare a variety of films, and has a wide range of applications.
3.   It is small in size and easy to operate.
Technical   parameters 1.   the power supply voltage: 220V 50Hz
2.   rated power: 1200W (excluding vacuum pump)
3.   Working vacuum degree: 10-4Pa
4.   working temperature: RT-500℃, accuracy ± 1×(you can increase the temperature according to actual needs)
5.   the number of target guns: 1
6.   target gun cooling method: water cooling
7.   Target size: Ø2’’, thickness 0.1-5mm (different thickness depending on target   material)
8.   DC sputtering power: 500W (optional)
9.   RF sputtering power: 300W / 500W (optional)
10.   loading sample table: Ø140mm
11.   the sample table speed: adjustable within 1rpm-20rpm
12.   Protective gas: inert gases such as Ar and N2
13.   Intake gas path: mass flow meter controls 2 channels of intake air, flow rate   is 200SCCM
specifications Main   unit size: 500mm × 560mm × 660mm, the whole machine size: 1300mm × 660mm ×   1200mm; weight: 160kg
Standard accessories 1 DC power control system 1
2 RF power control system 1
3 Film   thickness monitor system 1
4 Molecular pump 1
5 Chiller 1
6 Cooling water pipe (Ø6mm) 4
Standard accessories Various targets such as gold, indium, silver, and platinum



















Additional Information

  • Payment Terms L/C, T/TWestern Union
Interested in this product? Ask for more details & Latest Price from seller
Send Enquiry

Company Details close-icon

Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.

We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it\'s Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.

 

Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.

 

Our service range

We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.

 

Why us?

Providing reliable and trustworthy products

Equipped with highly knowledgeable staff

Having multiple ranges of products

Transparent pricing structure

Providing online support as well

  • Nature of Business Manufacturer / Exporter / Supplier
  • Number of Employees 20 - 50
  • Year of Establishment 2013
Tell us your Buy Requirement to Get Instant Response
Tell us what you need?

Looking for Nst 300-2hd Dual Target Magnetron Sputtering Coater?

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Nst 300-2hd Dual Target Magnetron Sputtering Coater at Best Price in Gautam Buddha Nagar
Products / Services
  • Products / Services
  • Companies
  • Buy Leads
Post Buy Requirement

Nst 300-2hd Dual Target Magnetron Sputtering Coater

Listing ID #7312748

  • MOQ 1 Piece
  • FinishingPolished
  • FeatureEasy To Use, Long Life, Strong Structure, Sturdiness
  • TypeSputtering Target
  • Country of OriginIndia
  • Supply Type Manufacturer, Exporter
Preferred Buyer From : All over the world
View More Details
Send Enquiry

Company Information

  • Member Since 8 Years
  • Nature of Business Supplier
  • Year of Establishment 2013

Ask for more detail from the seller

Contact Supplier

Product Details no_img_icon

  • Finishing Polished
  • Feature Easy To Use, Long Life, Strong Structure, Sturdiness
  • Type Sputtering Target
  • Country of Origin India
  • Model Number 300-2HD
  • RF Sputtering Power 300W / 500W (Optional)
  • Power Supply Voltage 220V, 50 Hz
  • The Number of Target Guns 1
  • Working Vacuum Degree 10-4Pa

300-2HD DUAL TARGET MAGNETRON SPUTTERING COATER is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and ceramic. Film, dielectric film, optical film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it has the advantages of small size and easy operation, and a wide range of materials that can be used. It is an ideal equipment for preparing various types of material films in the laboratory.


Technical Specifications

Name Dual target magnetron sputtering coater
Model 300-2HD
Installation   conditions This   equipment is required to be used at the altitude of 1000m or less, the   temperature of 25℃±15℃,   and the humidity of 55% Rh ± 10% Rh.
1.   Water: The equipment is equipped with a self-circulating chiller (filling   pure water or deionized water)
2.   Electricity: AC220V 50Hz, must have a good ground connection.
3.   Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double ferrule   joint) and pressure reducing valve
4.   Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg
5. Ventilation device: need
Main features 1.   Configure two target guns, A matching RF power supply is used for sputter   coating of non-conductive targets, and a matching DC power supply is used for   sputter coating of conductive materials.
2.   It can prepare a variety of films, and has a wide range of applications.
3.   It is small in size and easy to operate.
Technical   parameters 1.   the power supply voltage: 220V 50Hz
2.   rated power: 1200W (excluding vacuum pump)
3.   Working vacuum degree: 10-4Pa
4.   working temperature: RT-500℃, accuracy ± 1×(you can increase the temperature according to actual needs)
5.   the number of target guns: 1
6.   target gun cooling method: water cooling
7.   Target size: Ø2’’, thickness 0.1-5mm (different thickness depending on target   material)
8.   DC sputtering power: 500W (optional)
9.   RF sputtering power: 300W / 500W (optional)
10.   loading sample table: Ø140mm
11.   the sample table speed: adjustable within 1rpm-20rpm
12.   Protective gas: inert gases such as Ar and N2
13.   Intake gas path: mass flow meter controls 2 channels of intake air, flow rate   is 200SCCM
specifications Main   unit size: 500mm × 560mm × 660mm, the whole machine size: 1300mm × 660mm ×   1200mm; weight: 160kg
Standard accessories 1 DC power control system 1
2 RF power control system 1
3 Film   thickness monitor system 1
4 Molecular pump 1
5 Chiller 1
6 Cooling water pipe (Ø6mm) 4
Standard accessories Various targets such as gold, indium, silver, and platinum



















Additional Information

  • Payment Terms L/C, T/TWestern Union
Interested in this product? Ask for more details & Latest Price from seller
Send Enquiry

Company Details close-icon

Nano Science and Technology Company, founded by Mr Peeyush Dixit in 2013, has been a pioneer as a supplier and importer of multiple electronic and industrial uses chemicals in Gautam Buddha Nagar, Uttar Pradesh India. With a committed commitment to advantage and a customer-centric approach, we have established ourselves as a dependable name in both domestic and corporate sectors.

We recognize the importance of a clean and organized environment, be it at home or in the workplace. Our products are tailored to meet the exclusive requirements of each client, certifying the successful completion of all customer purposes. Whether it\'s Sputtering Systems, or Education and Research & Development areas, our team of skilled specialists is devoted to delivering top-notch results with efficiency and reliability.

 

Vision: Our products must fulfill all the industrial requirements also, renowned for our commitment to excellence, innovation, and sustainability.

 

Our service range

We are prominently providing reliable products like Muffle Furnaces, Vacuum Oven, Turbo Molecular Pump Station, Oxygen Plasma Cleaner, Lab Thin Film Coating System, Plasma Sputtering Coater, Thermal Evaporation Coater, Precision Temperature Controlled Hi-Vacuum Thermal Evaporating Coater etc.

 

Why us?

Providing reliable and trustworthy products

Equipped with highly knowledgeable staff

Having multiple ranges of products

Transparent pricing structure

Providing online support as well

  • Nature of Business Manufacturer / Exporter / Supplier
  • Number of Employees 20 - 50
  • Year of Establishment 2013
Tell us your Buy Requirement to Get Instant Response
Tell us what you need?

Looking for Nst 300-2hd Dual Target Magnetron Sputtering Coater?

Quantity
Seller Contact Details

Browse Related Categories

Waiting for permission
To search by voice, go to your browser settings and allow access to microphone

Allow microphone access to search with voice