Pvd Coating Machine

This sputtering system is equipped with 3 targets, also known as cathodes, and 1 linear type DC Ion Source for pretreatment. These parts are located at the left and right sides of the machine on pairs. In order to improve production yield, it consist of Univac’s large capacity oil diffusion pumps with faster pumping time and 2 batch type doors with revolution-rotation substrate holders. Effective automatic system control enables easy coating process and excellent products. Ar is the primary gas used to sputter atoms from the targets and O2 is used for reactive sputtering to adjust stereochemistry of oxides, if needed.