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Our Products

Our product range contains a wide range of AERA4 MASK INSPECTION System, PROVISION EBEAM INSPECTION SYSTEM, CENTURA TETRA EUV ADVANCED RETICLE ETCH, CENTRIS ADVANTEDGE MESA ETCH System and CENTRIS SYM3 ETCH

AERA4 MASK INSPECTION System

AERA4 MASK INSPECTION System
Equipped with a new lithography-grade lens, the Aera4 system demonstrates improved signal-to-noise for both standard high-resolution applications and aerial inspection, making it the tool of choice for 1x nm technology nodes and for early-production EUV mask inspection. The system performs highly sensitive mask inspection, as required for double- and quadruple-patterning lithography technologies, while maintaining a very low false alarm rate.
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PROVISION EBEAM INSPECTION SYSTEM

PROVISION EBEAM INSPECTION SYSTEM
As design rules scale into the single-digit nodes and device architectures become progressively denser and more complex, fabrication processes involve more steps, process control limits become tighter, and killer defects become smaller. These challenges make defect discovery and characterization ever more crucial in producing high yields of reliable, high-performance chips.
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