he Raider M is an automated, high-performance single-wafer ECD system. It features a precision, fully automated wafer handling system coupled with individual process chambers and is compatible with automated chemical management systems. Processes and recipes developed on the Raider M plaform are directly transferable to the high volume manufacturing Raider GT ECD system, making the move from R&D to full production seamless and immediate. Advanced metal deposition chambersOne or two process chambers150, 200, or 300mm wafer sizesBuilt to SEMI S2S8 guidelinesMini-environment with ionizationOpen cassette, SMIF, and FOUP load stationsSmall footprint (
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Ananda (Applied Materiald)
3340 Scott Blvd, M/S 0501
PO Box 58039
Santa Clara, CA 95052, United States
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